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Beamsplitter Coatings
45°Beamsplitter
- Substrate: fused silica, BK7
- Surface Figure: <λ/10 @ 632.8nm
- Surface Quality: 40-20
- Chamfer: 0.5mm, 45°
- Coating Material: Electron beam deposited dielectric: multi-layers
- Incident: 0°,45°
- Laser-Induced Damage Threshold: >5J/cm2 (1.06μm,1ns)
| Incident Angle |
Wavelength (nm) |
|
Separating |
|
Tolerance |
|
|
Tave/Rave |
Tp/Rp |
Tp/Rp |
|
| 45° |
510-500 |
50/50 |
|
|
±3% |
| 45° |
780 |
|
50/50 |
|
±3% |
| 45° |
632.8 |
50/50 |
|
|
±3% |
Dichroic Beamsplitter
- Substrate: fused silica, BK7
- Surface Figure: <λ/10 @ 632.8nm
- Surface Quality: 40-20
- Chamfer: 0.5mm, 45°
- Coating Material: Electron beam deposited dielectric: multi-layers
- Incident: 0°,
- Laser-Induced Damage Threshold: >5J/cm2 (1.06μm,1ns)
| Incident Angle |
TWavelength (nm) |
Transmission |
RWavelength |
Reflectance |
| 0° |
808 |
>90% |
946 |
>99.5% |
| 0° |
808 |
>90% |
1064 |
>99.5% |
| 0° |
808 |
>90% |
1320 |
>99.5% |
| 0° |
940 |
>90% |
1030 |
>99.5% |
Polarizing Beamsplitter Cubes
- Substrate fused: silica, BK7
- Surface Figure: <λ/10 @ 632.8nm
- Surface Quality: 40-20
- Chamfer: 0.5mm, 45°
- Coating Material: Electron beam deposited dielectric: multi-layers
- Incident:0°±2°
- Polarizing: Tp≥98%; Ts≤0.2%
- Extinction Ratio: Tp:Ts>500:1
- AR Coating: R<0.25%
| Wavelength (nm) |
| 632.8 |
| 780 |
| 830 |
| 852 |
| 1064 |
| 1310 |
| 1550 |
| 420-470 |
Polarizing Beamsplitter Plates
- Substrate fused: silica, BK7
- Surface Figure: <λ/10 @ 632.8nm
- Surface Quality: 40-20
- Chamfer: 0.5mm, 45°
- Coating Material: Electron beam deposited dielectric multi-layers
- Imcident Angle: 56.6°±3°
- Polarizing: Tp≥96%; Ts≤1%
- Extinction Ratio: Tp:Ts>100:1
- Wavelength Range: Visible, Near Infrared
| Wavelength (nm) |
Wavelength (nm) |
| 20/25.4/30 |
780 |
| 20/25.4/30 |
1064 |
| 20/25.4/30 |
1310 |
| 20/25.4/30 |
1550 |
